A new approach to spatially controllable CVD

Author

Choo, Jae-Ouk ; Adomaitis, Raymond A. ; Rubloff, Gary W. ; Henn-Lecordier, Laurent ; Cai, Yuhong

Author_Institution

Dept. of Chem. Eng., Maryland Univ., College Park, MD, USA

Volume

1

fYear

2004

fDate

June 30 2004-July 2 2004

Firstpage

287

Abstract

This work describes the continuing design evolution of a new approach to spatially controllable chemical vapor deposition for electronic materials manufacturing. Based on the success of a previous prototype reactor, we describe construction of a newer version of the prototype reactor system to assess its performance and identify its key operational characteristics. This new design includes a fully automated feed gas control system, allowing the reprogramming of reactor operation without hardware modifications and a time-shared gas sampling mass spectrometer for spatially resolved across-wafer gas composition analysis.

Keywords

chemical vapour deposition; electronics industry; production engineering computing; automated feed gas control system; continuing design evolution; electronic materials manufacturing; spatially controllable CVD; spatially controllable chemical vapor deposition; spatially resolved across-wafer gas composition analysis; time-shared gas sampling mass spectrometer;

fLanguage

English

Publisher

ieee

Conference_Titel

American Control Conference, 2004. Proceedings of the 2004

Conference_Location

Boston, MA, USA

ISSN

0743-1619

Print_ISBN

0-7803-8335-4

Type

conf

Filename

1383619