DocumentCode
430274
Title
Integrated schottky mixer diodes with cut off frequencies above 1THz
Author
Morschbach, M. ; Schollhorn, C. ; Oehme, M. ; Kasper, E. ; Muller, A. ; Buck, T.
Volume
3
fYear
2004
fDate
12-14 Oct. 2004
Firstpage
1133
Lastpage
1136
Abstract
In this paper we present firstly Schottky diodes, which are fully monolithical, integrated on a high resistivity silicon (FZ) substrate with cut-off frequencies above 1THz. The Schottky diodes have been manufactured successfully within an integration process. The integration process is a combination of two single processes, an Schottky-diode-process and a MEMS process. The very high cut off frequency was achieved even for very large area diodes using the MOTT operation mode. Therefore the vertical design, respectively the desigu of the epitaxial layers, have been improved.
Keywords
Conductivity; Cutoff frequency; Etching; Fabrication; Molecular beam epitaxial growth; Research and development; Schottky diodes; Semiconductor diodes; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2004. 34th European
Conference_Location
Amsterdam, The Netherlands
Print_ISBN
1-58053-992-0
Type
conf
Filename
1411201
Link To Document