DocumentCode :
430274
Title :
Integrated schottky mixer diodes with cut off frequencies above 1THz
Author :
Morschbach, M. ; Schollhorn, C. ; Oehme, M. ; Kasper, E. ; Muller, A. ; Buck, T.
Volume :
3
fYear :
2004
fDate :
12-14 Oct. 2004
Firstpage :
1133
Lastpage :
1136
Abstract :
In this paper we present firstly Schottky diodes, which are fully monolithical, integrated on a high resistivity silicon (FZ) substrate with cut-off frequencies above 1THz. The Schottky diodes have been manufactured successfully within an integration process. The integration process is a combination of two single processes, an Schottky-diode-process and a MEMS process. The very high cut off frequency was achieved even for very large area diodes using the MOTT operation mode. Therefore the vertical design, respectively the desigu of the epitaxial layers, have been improved.
Keywords :
Conductivity; Cutoff frequency; Etching; Fabrication; Molecular beam epitaxial growth; Research and development; Schottky diodes; Semiconductor diodes; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2004. 34th European
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
1-58053-992-0
Type :
conf
Filename :
1411201
Link To Document :
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