• DocumentCode
    430274
  • Title

    Integrated schottky mixer diodes with cut off frequencies above 1THz

  • Author

    Morschbach, M. ; Schollhorn, C. ; Oehme, M. ; Kasper, E. ; Muller, A. ; Buck, T.

  • Volume
    3
  • fYear
    2004
  • fDate
    12-14 Oct. 2004
  • Firstpage
    1133
  • Lastpage
    1136
  • Abstract
    In this paper we present firstly Schottky diodes, which are fully monolithical, integrated on a high resistivity silicon (FZ) substrate with cut-off frequencies above 1THz. The Schottky diodes have been manufactured successfully within an integration process. The integration process is a combination of two single processes, an Schottky-diode-process and a MEMS process. The very high cut off frequency was achieved even for very large area diodes using the MOTT operation mode. Therefore the vertical design, respectively the desigu of the epitaxial layers, have been improved.
  • Keywords
    Conductivity; Cutoff frequency; Etching; Fabrication; Molecular beam epitaxial growth; Research and development; Schottky diodes; Semiconductor diodes; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2004. 34th European
  • Conference_Location
    Amsterdam, The Netherlands
  • Print_ISBN
    1-58053-992-0
  • Type

    conf

  • Filename
    1411201