• DocumentCode
    435945
  • Title

    Poisson-Boltzmann solutions to the one-dimensional oxide-silicon-oxide system

  • Author

    Wong, Man ; Shi, Xuejie

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., China
  • Volume
    2
  • fYear
    2004
  • fDate
    18-21 Oct. 2004
  • Firstpage
    1175
  • Abstract
    Analytical solutions to the 1-dimensional, double-side gated oxide-silicon-oxide system with intrinsic silicon body are presented. The solution space, parameterized by the gate bias conditions, is divided into two separate domains admitting either a "zero-field" or a "zero-potential" solution. The boundary between the two domains is defined by the "zero-potential and zero-field" solution. Some general implications of the solutions are discussed. Screening effects leading to "saturation" of the body potential and electric field are discussed. The "zero-field" solution is used to define and analyse the linearly extrapolated threshold voltage values of symmetrical double-gate metal-oxide-semiconductor devices, with or without deliberate body doping.
  • Keywords
    MIS devices; MOS integrated circuits; electric potential; silicon compounds; threshold elements; 1D oxide-silicon-oxide system; MOS capacitor; Poisson-Boltzmann solution; double-side gated oxide-silicon-oxide system; linearly extrapolated threshold voltage; symmetrical double-gate metal-oxide-semiconductor devices; zero-field solution; zero-potential solution; Art; Doping; Electric potential; Electrodes; Equations; Insulation; MOS capacitors; Silicon; Telephony; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
  • Print_ISBN
    0-7803-8511-X
  • Type

    conf

  • DOI
    10.1109/ICSICT.2004.1436734
  • Filename
    1436734