DocumentCode :
437316
Title :
Resist elution study for immersion lithography
Author :
Sato, Mitsuru ; Yoshida, Masaaki ; Ishizuka, K. ; Tsuji, Hiromitsu ; Endo, Kotaro
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
34
Lastpage :
35
Keywords :
Coatings; Lithography; Mass spectroscopy; Performance analysis; Performance evaluation; Resins; Resists; Semiconductor device modeling; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245708
Filename :
1459458
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437316
