DocumentCode
437322
Title
Proposal of large exposure area and wide dimensional X-ray lithography for liga process using energy variable synchrotron radiation
Author
Utsumi, Yuichi ; Kishimoto, Takefumi ; Hattori, Tadashi ; Hara, Hirotsugu
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
104
Lastpage
105
Keywords
Fabrication; Microstructure; Proposals; Resists; Shape; Storage rings; Strontium; Substrates; Synchrotron radiation; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245745
Filename
1459495
Link To Document