DocumentCode
437328
Title
Modeling the process of electron-beam-induced deposition by dynamic Monte Carlo simulation
Author
Liu, Z.Q. ; Mitsuishi, K. ; Furuya, K.
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
146
Lastpage
147
Keywords
Electron microscopy; Materials science and technology; Microelectronics; Monte Carlo methods; Probes; Shape; Spatial resolution; Tungsten; Voltage; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245766
Filename
1459516
Link To Document