20 nm periodical pattern by calixarene resists: comparison of CMC[4]AOMe with MC[6]AOAc

Author

Miyamoto, Yasuyuki ; Shirai, Yasuyuki ; Yoshizawa, Masaki ; Furuya, Kazuhito

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

196

Lastpage

197

Keywords

Acceleration; Degradation; Educational technology; Electron beams; Indium phosphide; Nanotechnology; Resists; Space technology; Voltage; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245791

Filename

1459541

Link To Document