• DocumentCode
    438351
  • Title

    Properties of half-metallic double-perovskite thin films

  • Author

    Asano, H. ; Koduka, N. ; Imaeda, K. ; Sugiyama, M. ; Matsui, M.

  • Author_Institution
    Dept. of Crystalline Mater. Sci., Nagoya Univ., Japan
  • fYear
    2005
  • fDate
    4-8 April 2005
  • Firstpage
    1883
  • Lastpage
    1884
  • Abstract
    This paper reports the magnetic, and electrical properties of epitaxial thin films with an ordered double-perovskite structure. High-quality Sr2FeMoO6 (SFMO) and Sr2CrReO6 (SCRO) films have been grown by sputtering onto the completely lattice-matched substrates of Ba0.4Sr0.6TiO3-buffered and bare SrTiO3, respectively. These films exhibit high saturation magnetization Ms values (3.8 μB/f.u. for SFMO and 0.9 μB/f.u. for SCRO), which are close to the expected values for their half-metallicity, and high-Tc values (385 K for SFMO and 620 K for SCRO). The atomically flat surfaces free from any surface precipitate enable us to employ a standard photolithographic process for fabricating magnetic tunnel junctions based on these films. Magnetic tunnel junctions are completed with a native barrier formed by surface oxidation of a base-electrode film and a Co counterelectrode, showing 10% tunnel magnetoresistance (TMR) ratio at 4.2 K for a SFMO film.
  • Keywords
    chromium compounds; iron compounds; magnetic epitaxial layers; magnetisation; oxidation; photolithography; semimetallic thin films; sputter deposition; strontium compounds; tunnelling magnetoresistance; 4.2 K; Ba0.4Sr0.6TiO3; Sr2CrReO6-Co; Sr2FeMoO6-Co; SrTiO3; atomically flat surfaces; base-electrode film; counterelectrode; double-perovskite thin films; electrical properties; epitaxial thin films; half-metallicity; lattice-matched substrates; magnetic properties; magnetic tunnel junctions; photolithographic process; saturation magnetization; sputtering; surface oxidation; tunnel magnetoresistance; Magnetic films; Magnetic properties; Magnetic tunneling; Oxidation; Saturation magnetization; Sputtering; Strontium; Substrates; Transistors; Tunneling magnetoresistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
  • Print_ISBN
    0-7803-9009-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2005.1464375
  • Filename
    1464375