Title :
Molecular dynamics investigations for thin film growth morphology of Ni/Ni(111)
Author :
Lee, Soon-Gun ; Lee, Kwang-Ryeol ; Chung, Yong-Chae
Author_Institution :
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
Abstract :
The deposition process of Ni atoms on Ni(111) substrate for various adatom incident energy was intensively investigated by using molecular dynamics (MD) method in order to investigate morphology and quality of thin-film in atomic level. The surface roughness of the system was calculated for 1, 3 and 5 ML deposition of Ni adatom.
Keywords :
adsorbed layers; metallic thin films; molecular dynamics method; nickel; sputter deposition; surface morphology; surface roughness; Ni; adatom deposition; adatom incident energy; molecular dynamics investigations; surface roughness; thin film growth morphology; Atomic layer deposition; Ceramics; Nonhomogeneous media; Rough surfaces; Sputtering; Stress; Substrates; Surface morphology; Surface roughness; Transistors;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464490
