• DocumentCode
    439346
  • Title

    Madematching: Methodology and tool for matching simulation

  • Author

    Janssens, Er. ; Graindourze, B. ; Casier, H.

  • Author_Institution
    Alcatel Microelectronics, Brussels, Belgium
  • fYear
    1998
  • fDate
    22-24 Sept. 1998
  • Firstpage
    500
  • Lastpage
    503
  • Abstract
    A methodology and tool is presented, which enables the designer to simulate the influence of random offset variations on his circuit without any manual calculation. The starting point is a schematic and extra information on the transistor layout and the result is a report on the total random offset and a list of its main components.
  • Keywords
    Analytical models; Capacitance; Circuit simulation; Circuit topology; Erbium; Integrated circuit technology; Low voltage; Microelectronics; Monte Carlo methods; Sensitivity analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 1998. ESSCIRC '98. Proceedings of the 24th European
  • Type

    conf

  • DOI
    10.1109/ESSCIR.1998.186318
  • Filename
    1471075