• DocumentCode
    439349
  • Title

    VLSI memory technology: Current status and future trends

  • Author

    Itoh, Kiyoo ; Kimura, Shinichiro ; Sakata, Takeshi

  • Author_Institution
    Hitachi Ltd., Tokyo, Japan
  • fYear
    1999
  • fDate
    21-23 Sept. 1999
  • Firstpage
    3
  • Lastpage
    10
  • Abstract
    In this paper, first, newly developed state-of-the-art VLSI memory chips, exemplified by DRAM, SRAM, and Flash memory, are discussed. Second, technology trends concerning standard DRAM´s, embedded memories, and low-voltage memories are reviewed. For standard DRAM´s, memory cells with high cell capacitance, high-speed subsystem technologies (such as synchronous operations, pipelining/prefetching, and use of packet protocols), and small-swing interfaces are investigated. And regarding embedded memories, the advantages and the challenges involved in reducing process costs are presented. Moreover, the use of special circuits to reduce subthreshold current in low-voltage memories is summarized, citing examples of recent advancements. Finally, it is emphasized that a unified memory cell, such as a gain cell (which includes all the advantages of the existing memory cells) must be developed in the near future.
  • Keywords
    Capacitance; Circuits; Costs; Flash memory; Pipeline processing; Prefetching; Protocols; Random access memory; Subthreshold current; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 1999. ESSCIRC '99. Proceedings of the 25th European
  • Conference_Location
    Duisburg, Germany
  • Type

    conf

  • Filename
    1471083