DocumentCode
439349
Title
VLSI memory technology: Current status and future trends
Author
Itoh, Kiyoo ; Kimura, Shinichiro ; Sakata, Takeshi
Author_Institution
Hitachi Ltd., Tokyo, Japan
fYear
1999
fDate
21-23 Sept. 1999
Firstpage
3
Lastpage
10
Abstract
In this paper, first, newly developed state-of-the-art VLSI memory chips, exemplified by DRAM, SRAM, and Flash memory, are discussed. Second, technology trends concerning standard DRAM´s, embedded memories, and low-voltage memories are reviewed. For standard DRAM´s, memory cells with high cell capacitance, high-speed subsystem technologies (such as synchronous operations, pipelining/prefetching, and use of packet protocols), and small-swing interfaces are investigated. And regarding embedded memories, the advantages and the challenges involved in reducing process costs are presented. Moreover, the use of special circuits to reduce subthreshold current in low-voltage memories is summarized, citing examples of recent advancements. Finally, it is emphasized that a unified memory cell, such as a gain cell (which includes all the advantages of the existing memory cells) must be developed in the near future.
Keywords
Capacitance; Circuits; Costs; Flash memory; Pipeline processing; Prefetching; Protocols; Random access memory; Subthreshold current; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 1999. ESSCIRC '99. Proceedings of the 25th European
Conference_Location
Duisburg, Germany
Type
conf
Filename
1471083
Link To Document