• DocumentCode
    440001
  • Title

    High transmission x-ray masks for lithographic applications

  • Author

    Bassous, E. ; Feder, R. ; Spiller, E. ; Topalian, J.

  • Volume
    21
  • fYear
    1975
  • fDate
    1975
  • Firstpage
    17
  • Lastpage
    19
  • Abstract
    The fabrication steps for x-ray masks on thin (about 2000 Å) Si3N4substrates are described. The new mask substrates have a transmission close to one for AlKαradiation; the fabrication is less critical than for Si membranes.
  • Keywords
    Anisotropic magnetoresistance; Biomembranes; Chemical processes; Cleaning; Etching; Fabrication; Gold; Resists; Semiconductor films; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1975 International
  • Conference_Location
    IEEE
  • Type

    conf

  • Filename
    1478175
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=440001