• DocumentCode
    440260
  • Title

    The effect of elevated temperature on the reliability of very thin oxide films

  • Author

    Kaczer, B. ; Degraeve, R. ; Pangon, N. ; Nigam, T. ; Groeseneken, G.

  • Author_Institution
    IMEC, Leuven, Belgium
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    356
  • Lastpage
    359
  • Keywords
    Acceleration; Electric breakdown; Integrated circuit reliability; Integrated circuit technology; Logic circuits; Logic devices; Silicon carbide; Stress measurement; Temperature distribution; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505513