High performance raised Gate/Source/Drain transistors for sub-0.15 um CMOS technologies

Author

Meer, H. Van ; Kubicek, S. ; Lyu, Jianguo ; Caymax, M. ; Loo, R. ; Meyer, K. De

Author_Institution

IMEC, Leuven, Belgium

Volume

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

388

Lastpage

391

Keywords

Boron; CMOS technology; Fabrication; Implants; Isolation technology; Lithography; MOSFETs; Rapid thermal processing; Silicon; Space technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

Filename

1505521

Link To Document