DocumentCode
440274
Title
Structure and Memory Effects of Low Energy Ge-Implanted Thin SiO2 Films
Author
Kapetanakis, E. ; Normand, P. ; Tsoukalas, D. ; Beltsios, K. ; Travlos, T. ; Gautier, J. ; Palun, L. ; Jourdan, F.
Author_Institution
National Centre for Scientific Research "Demokritos", Aghia Paraskevi, Greece
Volume
1
fYear
1999
fDate
13-15 Sept. 1999
Firstpage
432
Lastpage
435
Keywords
Amorphous materials; Annealing; Capacitance-voltage characteristics; Capacitors; Electron traps; Glass; Material storage; Temperature; Transmission electron microscopy; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location
Leuven, Belgium
Print_ISBN
2-86332-245-1
Type
conf
Filename
1505532
Link To Document