DocumentCode

440302

Title

Impact of Elevated Source/Drain on the Reverse Short Channel Effect

Author

Schumann, D. ; Cappellani, A. ; Hammerl, E. ; Krieg, R. ; Pindl, S. ; Schäfer, H.

Author_Institution

Infineon Technologies AG, Munich, Germany

Volume

1

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

572

Lastpage

575

Keywords

CMOS process; Doping; Epitaxial growth; Length measurement; MOSFETs; Oxidation; Performance evaluation; Silicon; Temperature distribution; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

conf

Filename

1505567