Investigation of the Suppression of the Narrow Channel Effect in Deep Sub-Micron EXTIGATE Transistors

Author

Burenkov, A. ; Tietzel, K. ; Lorenz, J. ; Ryssel, H. ; Schwalke, U.

Author_Institution

Fraunhofer-Institut f¨ur Integrierte Schaltungen, Erlangen, Germany

Volume

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

684

Lastpage

687

Keywords

CMOS process; CMOS technology; Doping; Electrodes; Isolation technology; MOSFETs; Oxidation; Shape; Silicon; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

Filename

1505595

Link To Document