Hybrid RF plasma reactor analysis

RF plasma technology now is widely used in electronics industry. In depending on the area of application the plasma technological systems (RF power supplies, reactor designs, using physical processes) may differ significantly. However, with designing the any of them, there are some common requirements. Major of them are productivity and repeatability of plasma technological processes. Solving these problems is often related with creating the large-size uniform RF plasma and reactor design optimization. This paper deals with the design consideration and analysis of so-called hybrid cylindrical reactor having improved characteristics in comparison with the "traditional" inductively and capacitive coupled reactors.