Towards wafer-scale integration of high-repetition-rate passively mode-locked surface-emitting semiconductor lasers

Author

Unold, H.J. ; Lorenser, D. ; Maas, D.J.H.C. ; Aschwanden, A. ; Grange, R. ; Paschotta, R. ; Keller, U. ; Gini, E. ; Ebling, D.

Author_Institution

Dept. of Phys., Swiss Fed. Inst. of Technol., Switzerland

Volume

2

fYear

2005

fDate

22-27 May 2005

Firstpage

1393

Abstract

We demonstrate the fabrication of a key element for monolithic integration of mode-locked VECSELs, namely a quantum-dot-based SESAM with reduced saturation fluence, which allows stable mode locking with similar mode areas on gain and absorber.

Keywords

integrated optics; laser beams; laser mirrors; laser mode locking; laser modes; laser stability; monolithic integrated circuits; optical fabrication; optical saturable absorption; semiconductor lasers; semiconductor quantum dots; surface emitting lasers; wafer-scale integration; monolithic integration; passively mode-locked laser; quantum-dot-based SESAM; semiconductor saturable absorber mirror; surface-emitting semiconductor laser; wafer-scale integration; Laser mode locking; Laser stability; Laser theory; Monolithic integrated circuits; Optical device fabrication; Physics; Quantum dot lasers; Semiconductor lasers; Surface emitting lasers; Wafer scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2005. (CLEO). Conference on

Print_ISBN

1-55752-795-4

Type

conf

DOI

10.1109/CLEO.2005.202136

Filename

1573202