DocumentCode
454451
Title
Lens Aberration Aware Timing-Driven Placement
Author
Kahng, Andrew B. ; Park, Chul-Hong ; Sharma, Puneet ; Wang, Qinke
Author_Institution
Dept. of ECE, California Univ., San Diego, CA
Volume
1
fYear
2006
fDate
6-10 March 2006
Firstpage
1
Lastpage
6
Abstract
Process variations due to lens aberrations are to a large extent systematic, and can be modeled for purposes of analyses and optimizations in the design phase. Traditionally, variations induced by lens aberrations have been considered random due to their small extent. However, as process margins reduce, and as improvements in reticle enhancement techniques control variations due to other sources with increased efficacy, lens aberration-induced variations gain importance. For example, our experiments indicate that lens aberration can result in up to 8% variation in cell delay. In this paper, we propose an aberration-aware timing-driven analytical placement approach that accounts for aberration-induced variations during placement. Our approach minimizes the design´s cycle time and prevents hold-time violations under systematic aberration-induced variations. On average, the proposed placement technique reduces cycle time by ~ 5% at the cost of ~ 2% increase in wire length
Keywords
aberrations; integrated circuit design; lithography; reticles; aberration-aware analytical placement; cell delay; lens aberration; reticle enhancement; timing-driven analytical placement; wire length; Analytical models; Clocks; Costs; Delay; Electrical capacitance tomography; Lenses; Libraries; Lithography; Optical design; Timing;
fLanguage
English
Publisher
ieee
Conference_Titel
Design, Automation and Test in Europe, 2006. DATE '06. Proceedings
Conference_Location
Munich
Print_ISBN
3-9810801-1-4
Type
conf
DOI
10.1109/DATE.2006.243803
Filename
1657016
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