• DocumentCode
    460330
  • Title

    2D Multiple Beam Interference Lithography

  • Author

    Apostol, A.D. ; Damian, V. ; Garoi, F. ; Iordache, Luliana ; Logofatu, P.C. ; Nascov, V. ; Sima, A. ; Cristea, B. Dana ; Muller, Raluca

  • Author_Institution
    Dept. of Lasers, National Inst. for Laser, Plasma & Radiat. Phys., M gurele
  • Volume
    1
  • fYear
    2006
  • fDate
    27-29 Sept. 2006
  • Firstpage
    151
  • Lastpage
    154
  • Abstract
    Interference or holographic lithography seems to be the most studied lithographic technique today for obtaining large area of symmetric patterns as a result of the interference of two, three, four or more beams of different shape or structures. Simulated and corresponding real fringe patterns are presented
  • Keywords
    holography; interference; lithography; 2D multiple beam; holographic lithography; interference lithography; real fringe patterns; symmetric patterns; Gratings; Holography; Interference; Laser beams; Laser theory; Lithography; Optical device fabrication; Periodic structures; Plasmas; Resists; holography; lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    International Semiconductor Conference, 2006
  • Conference_Location
    Sinaia
  • Print_ISBN
    1-4244-0109-7
  • Type

    conf

  • DOI
    10.1109/SMICND.2006.283955
  • Filename
    4063182
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=460330