• DocumentCode
    46281
  • Title

    Physical Analysis and Design of Resonant Plasma-Wave Transistors for Terahertz Emitters

  • Author

    Jong Yul Park ; Sung-Ho Kim ; Sung-Min Hong ; Kyung Rok Kim

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Ulsan Nat. Inst. of Sci. & Technol., Ulsan, South Korea
  • Volume
    5
  • Issue
    2
  • fYear
    2015
  • fDate
    Mar-15
  • Firstpage
    244
  • Lastpage
    250
  • Abstract
    In this work, we performed physical analysis of resonant plasma-wave transistors (PWTs) for terahertz (THz) emitters. Through the analytical decomposition of plasma-waves into upstream and downstream focusing on the different phase velocity, we show that the reflection coefficient is over unity and newly introduce the PWT design window based on a simple 2-D plot, which can provide both the maximum channel length (Lmax) and operation frequency. By our design window analysis, strained silicon channel with a momentum relaxation time of 50-160 fs (i.e., channel mobility 500-1500 cm2/Vs) show technology-compatible Lmax as 12-40 nm with a tunable resonance frequency of 2- 10 THz .
  • Keywords
    elemental semiconductors; field effect transistors; plasma focus; plasma waves; reflectivity; silicon; terahertz wave devices; 2D plot; Si; analytical decomposition; design window analysis; downstream focusing; frequency 2 THz to 10 THz; maximum channel length; momentum relaxation time; operation frequency; phase velocity; physical analysis; reflection coefficient; resonant plasma-wave transistors; size 12 nm to 40 nm; strained silicon channel; terahertz emitters; time 50 fs to 160 fs; tunable resonance frequency; upstream focusing; HEMTs; Logic gates; MODFETs; Oscillators; Resonant frequency; Silicon; Plasma-wave transistor (PWT); design window; emitter; maximum channel length; mobility; momentum relaxation time; resonance frequency; strained silicon; terahertz (THz);
  • fLanguage
    English
  • Journal_Title
    Terahertz Science and Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    2156-342X
  • Type

    jour

  • DOI
    10.1109/TTHZ.2015.2392630
  • Filename
    7029115