Title :
Technology and Modeling of Submicron Contacts
Author :
Wright, P. ; Loh, W. ; Fu, C-C ; Dameron, D. ; Saraswat, K.
Author_Institution :
Department of Electrical Engineering 3 AEL, Stanford University, Stanford, CA 94305 USA
Keywords :
Boron; CMOS technology; Contact resistance; Dry etching; Electrical resistance measurement; Semiconductor device measurement; Semiconductor device modeling; Silicon; Testing; Tin;
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
