Title :
Two-Dimensional Process Modeling for High Density (LOCOS) Technology
Author :
Dutton, Robert W. ; Mei, Len ; Chin, Daeje ; Kump, Mike
Author_Institution :
Integrated Circuits Laboratory Stanford University Stanford, CA 94305
Keywords :
Analytical models; Boron; Etching; Impurities; Integrated circuit modeling; MOS devices; Oxidation; Plasma applications; Plasma simulation; Silicon;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
