DocumentCode
472864
Title
The Comprehensive Model of Oxidation-Enhanced Diffusion
Author
Sakamoto, K. ; Nishi, K. ; Miyoshi, T.
Author_Institution
OKI Electric Industry Company, Ltd. 550-1 Higashiasakawa, Hachioji, Tokyo 193, Japan
fYear
1982
fDate
1-3 Sept. 1982
Firstpage
98
Lastpage
99
Keywords
Crystallization; Electrical resistance measurement; Ellipsometry; Impurities; Oxidation; Semiconductor device modeling; Semiconductor process modeling; Silicon; Surface fitting; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1982. Digest of Technical Papers. Symposium on
Conference_Location
Oiso, Japan
Type
conf
Filename
4480595
Link To Document