DocumentCode

472883

Title

Trench Isolation Technology and Device Physics

Author

Goodwin, S.H. ; Plummer, J.D.

Author_Institution

Integrated Circuits Lab, Stanford University A. E. L. 4, Stanford, CA 94305

fYear

1983

fDate

13-15 Sept. 1983

Firstpage

28

Lastpage

29

Keywords

Etching; Fabrication; Isolation technology; Large Hadron Collider; Oxidation; Physics; Silicon; Temperature control; Tires; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1983. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Print_ISBN

4-930813-05-0

Type

conf

Filename

4480622