DocumentCode

472912

Title

A Novel Tungsten Gate Technology for VLSI Applications

Author

Kobayashi, Nobuyoshi ; Iwata, Seiichi ; Yamamoto, Naoki ; Terada, Tomoyuki

Author_Institution

Central Research Lab., Hitachi Ltd. Kokubunji, Tokyo, Japan

fYear

1983

fDate

13-15 Sept. 1983

Firstpage

94

Lastpage

95

Keywords

Annealing; Chemical analysis; Coatings; Conductivity; Electrodes; Fabrication; Oxidation; Temperature; Tungsten; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1983. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Print_ISBN

4-930813-05-0

Type

conf

Filename

4480653