Title :
Poly-Oxide/Nitride/Oxide Structures for Highly Reliable EPROM Cells
Author :
Mori, S. ; Sato, M. ; Mikata, Y. ; Yoshikawa, K. ; Yanase, T.
Author_Institution :
Semiconductor Device Engineering Laboratory Toshiba Corporation, Kawasaki, Japan
Keywords :
Capacitors; Conductive films; EPROM; Electrons; Insulation; Leakage current; Oxidation; Stress; Thermal conductivity; Voltage;
Conference_Titel :
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
4-930813-08-5
