DocumentCode
474465
Title
ESL hand-off: Fact or EDA fiction?
Author
Yagi, Hiroyuki ; Haritan, Eshel ; Smith, Gary ; Roesner, Wolfgang ; Tangi, Hidekazu ; Dutt, Nikil ; Kogel, Tim ; McNamara, Michael ; Mancini, Giovanni
Author_Institution
STARC, Yokohama
fYear
2008
fDate
8-13 June 2008
Firstpage
310
Lastpage
312
Abstract
Moving up in the level of abstraction is the holy grail of EDA. Each transition to the next level of abstraction allows 100x improvement in simulation speed and 100x improvement in design productivity. ESL is being promoted as the next level above RTL but is it really happening? (1) What is exactly ESL? What can be automated? (2) Is ESL a new design entry level? What are the benefits of the new entry level? (3 Why don\´t we see wide adoption by HW designers? (4) Did we find another way to gain productivity? Is ESL finally enabling IP reuse? (5) Are we going to see a transition from "RTL design/hand- off + Gate level sign-off to "ESL design/hand-off + RTL sign-off? What does ESL hand-off mean? (6) Can ESL address the design of convergent (multiple) applications? This panel will discuss if we really need the new ESL tools or current RTL-based tools are sufficient and debate if not ESL then what are the new methodologies/tools/languages required to move to the next level of productivity. Then, it will carry out more in-depth discussions on if the ESL hand-off the next step in design. (i) Is there a common formalism/abstraction that captures ESL? (ii) Is it possible?
Keywords
electronic design automation; integrated circuit design; EDA; ESL; IP reuse; RTL-based tool; design productivity; electronic design automation; electronic system level design tool; register-transfer-level; Electronic design automation and methodology; Electronics industry; Environmental economics; Hardware; Productivity; Programming; Refining; Systems engineering and theory; Taxonomy; Yagi-Uda antennas; ESL; Hand-off; Sign-off; Specification; formalism;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2008. DAC 2008. 45th ACM/IEEE
Conference_Location
Anaheim, CA
ISSN
0738-100X
Print_ISBN
978-1-60558-115-6
Type
conf
Filename
4555829
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