• DocumentCode
    474499
  • Title

    Challenges in gate level modeling for delay and SI at 65nm and below

  • Author

    Keller, Igor ; King Ho Tarn ; Kariat, Vinod

  • Author_Institution
    Cadence Design Syst., Inc., San Jose, CA
  • fYear
    2008
  • fDate
    8-13 June 2008
  • Firstpage
    468
  • Lastpage
    473
  • Abstract
    In this paper we review the prior art and recent advances in the area of standard cell modeling for delay and noise analyses, suggest a taxonomy of different cell models, and discuss their strengths and weaknesses. We also discuss challenges in cell modeling for delay and noise analyses arising in new submicron process nodes.
  • Keywords
    delays; integrated circuit modelling; integrated circuit noise; logic gates; delay analyses; gate level modeling; noise analyses; size 65 nm; standard cell modeling; submicron process nodes; CMOS technology; Circuit simulation; Crosstalk; Delay; Integrated circuit modeling; Permission; Semiconductor device measurement; Semiconductor device modeling; Silicon; Timing; Delay Calculation; Gate Characterization; Gate Modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2008. DAC 2008. 45th ACM/IEEE
  • Conference_Location
    Anaheim, CA
  • ISSN
    0738-100X
  • Print_ISBN
    978-1-60558-115-6
  • Type

    conf

  • Filename
    4555863