• DocumentCode
    477224
  • Title

    Pulsed low energy electron sources for material surface modification

  • Author

    Korenev, S.A. ; Johnson, R.P.

  • Author_Institution
    Muons, Inc., 552 N. Batavia Avenue, IL 60510 USA
  • Volume
    1
  • fYear
    2007
  • fDate
    17-22 June 2007
  • Firstpage
    65
  • Lastpage
    68
  • Abstract
    Two conceptual designs of pulsed low energy electron sources (100 to 1000 ns and 1 to 50 keV) are investigated for the modification of surface properties of materials. The first design uses plasma formed on a dielectric, which is excited by a high-frequency pulse generator. The second uses a Micro-Channel Plate (MCP) to form the cathode plasma. Experimental results are presented on the formation of pulsed high-current, low-energy electron beams with large cross-sectional area.
  • Keywords
    Cathodes; Conducting materials; Electron beams; Electron sources; Particle beams; Plasma materials processing; Plasma sources; Plasma temperature; Pulse generation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Conference, 2007 16th IEEE International
  • Conference_Location
    Albuquerque, NM
  • Print_ISBN
    978-1-4244-0913-6
  • Electronic_ISBN
    978-1-4244-0914-3
  • Type

    conf

  • DOI
    10.1109/PPPS.2007.4651791
  • Filename
    4651791
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=477224