DocumentCode :
479371
Title :
Study of Ferrocene/Silicon hybrid memories: Influence of the chemical linkers and device thermal stability
Author :
Pro, T. ; Buckley, J. ; Barattin, R. ; Calborean, A. ; Gély, M. ; Huang, K. ; Delapierre, G. ; Duclairoir, F. ; Jalaguier, E. ; Maldivi, P. ; De Salvo, B. ; Deleonibus, S. ; Ghibaudo, G.
Author_Institution :
CEA-LETI-MINATEC, Grenoble
fYear :
2008
fDate :
15-19 Sept. 2008
Firstpage :
226
Lastpage :
229
Abstract :
In this paper we propose an experimental and theoretical analysis of hybrid Ferrocene/Si memory structures. Two main aspects are studied: the influence of the chemical linker length on Ferrocene/Silicon electron transfer rate, and the thermal stability of the hybrid devices. X-Ray Photoelectron Spectroscopy was used to analyse the chemical structure of the molecular layers. Cyclic Voltammetry and impedance spectroscopy were employed to study the charge transfer dependence on the molecular linker. Impedance tests allowed us to evaluate the thermal stability of the molecular memories. The devices were submitted to different annealing temperatures and annealing times. The degradation of the molecular layer and the parasitic oxidation of the device active areas allowed us to explain results. Finally the main molecular parameters were computed through Density Functional Theory (DFT) calculations.
Keywords :
X-ray photoelectron spectra; annealing; chemical structure; density functional theory; electric impedance; elemental semiconductors; molecular electronics; organic compounds; semiconductor storage; silicon; thermal stability; voltammetry (chemical analysis); DFT; X-ray photoelectron spectroscopy; annealing temperatures; annealing times; charge transfer dependence; chemical linkers; chemical structure; cyclic voltammetry; density functional theory; device thermal stability; electron transfer rate; ferrocene-silicon hybrid memories; impedance spectroscopy; molecular layers; molecular parameters; Annealing; Charge transfer; Chemical analysis; Electrochemical impedance spectroscopy; Electrons; Silicon; Temperature; Testing; Thermal degradation; Thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2008. ESSDERC 2008. 38th European
Conference_Location :
Edinburgh
ISSN :
1930-8876
Print_ISBN :
978-1-4244-2363-7
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2008.4681739
Filename :
4681739
Link To Document :
بازگشت