DocumentCode
48232
Title
Thermal Management of Hybrid Silicon Ring Lasers for High Temperature Operation
Author
Chong Zhang ; Di Liang ; Kurczveil, Geza ; Bowers, John E. ; Beausoleil, Raymond G.
Author_Institution
Syst. Res. Lab., Hewlett-Packard Labs., Palo Alto, CA, USA
Volume
21
Issue
6
fYear
2015
fDate
Nov.-Dec. 2015
Firstpage
1
Lastpage
7
Abstract
We discuss the thermal management of microring lasers on hybrid silicon platform in order to optimize their high-temperature lasing performance. The thermal impedance of microring lasers was improved with a novel thermal shunt design. We report a significant improvement of hybrid silicon microring laser performance, with the maximum continuous wave lasing stage temperature up to 105 °C.
Keywords
elemental semiconductors; micro-optics; quantum well lasers; ring lasers; silicon; Si; continuous wave lasing stage temperature; high-temperature lasing performance; hybrid silicon microring laser performance; hybrid silicon platform; thermal impedance; thermal management; thermal shunt design; Heating; Metals; Resistance; Ring lasers; Silicon; Substrates; Quantum well lasers; Ring lasers; Silicon photonics; Thermal management; ring lasers; silicon photonics; thermal management;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2015.2428057
Filename
7097634
Link To Document