DocumentCode
48250
Title
Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
Author
Young-cheol Kim ; Hyo-Chang Lee ; Chin-Wook Chung
Author_Institution
Dept. of Nanoscale Semicond. Eng., Hanyang Univ., Seoul, South Korea
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2858
Lastpage
2859
Abstract
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with changing rf power and gas pressure. As the ICP power increases at a fixed argon gas pressure of 100 mtorr, increase in the plasma density is observed at the radial edge. It could be understood by the neutral gas depletion in the discharge center and the step-ionization effect.
Keywords
argon; high-frequency discharges; ionisation; plasma boundary layers; plasma density; plasma diagnostics; 2-D measurement method; 2-D plasma density profile; Ar; ICP power; argon inductively coupled plasmas; discharge center; fixed argon gas pressure; neutral gas depletion; plasma uniformity; pressure 100 mtorr; radial edge; rf power; step-ionization effect; Density measurement; Iterative closest point algorithm; Plasma density; Plasma measurements; Pressure measurement; Semiconductor device measurement; ICP; neutral gas depletion; plasma uniformity;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2331362
Filename
6884864
Link To Document