DocumentCode :
48526
Title :
Effect of Work Function Difference Between Top and Bottom Electrodes on the Resistive Switching Properties of SiN Films
Author :
Seok Man Hong ; Hee-Dong Kim ; Ho-Myoung An ; Tae Geun Kim
Author_Institution :
Sch. of Electr. Eng., Korea Univ., Seoul, South Korea
Volume :
34
Issue :
9
fYear :
2013
fDate :
Sept. 2013
Firstpage :
1181
Lastpage :
1183
Abstract :
In this letter, the effect of the work function difference between various top electrodes (TE-Ni, W, Ti, and Al) and the Pt bottom electrode, ΔΦM, on the resistive switching (RS) of SiN thin films was investigated. The cells with W and Ti TEs showed stable RS, but others failed to show RS. In particular, the Ti TE exhibited low operating currents (~2 μA) and good retention properties (<; ~104 s at 85 °C). On the basis of the analysis of conduction mechanisms, it is found that stable RS of SiN films might be strongly related to the activation energy of traps induced by ΔΦM. Thus, the RS properties of the SiN films can be improved by engineering ΔΦM without additional processes.
Keywords :
silicon compounds; thin films; Al; Ni; SiN; Ti; W; activation energy; conduction mechanism; electrodes; resistive switching property; temperature 85 C; thin film; work function difference; Electrodes; Electron traps; Energy states; Nickel; Silicon; Silicon compounds; Switches; Activation energy of traps; resistive random access memories (RRAM); resistive switching; silicon nitride; work function difference;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2272631
Filename :
6563100
Link To Document :
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