• DocumentCode
    48708
  • Title

    Analysis of Carrier Transport in Short-Channel MOSFETs

  • Author

    Majumdar, Angshul ; Antoniadis, Dimitri A.

  • Author_Institution
    Res. Div., T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
  • Volume
    61
  • Issue
    2
  • fYear
    2014
  • fDate
    Feb. 2014
  • Firstpage
    351
  • Lastpage
    358
  • Abstract
    A method for extracting transport parameters in short-channel FETs is presented in the context of the Lundstrom model for quasi-ballistic short-channel FETs. The parameters extracted from measured data are unidirectional thermal velocity, critical length, and mean free path at low and high drain biases. The method is based on an analysis of the channel length dependence of apparent mobility and virtual-source (VS) velocity, which are obtained by fitting the VS model to measured data. Data from (100)-oriented undoped-body extremely thin silicon-on-insulator FETs with neutral stress liners are used to validate the method. Since this method does not assume any theoretical knowledge of band structure parameters, it can be applied to short-channel FETs with any geometry, any channel material, and with unknown levels of channel stress.
  • Keywords
    MOSFET; band structure; carrier mobility; semiconductor device models; silicon-on-insulator; (100)-oriented undoped-body; Lundstrom model; Si; apparent mobility; band structure parameters; carrier transport; channel length dependence; critical length; mean free path; quasiballistic short-channel FET; short-channel MOSFET; silicon-on-insulator; transport parameters; unidirectional thermal velocity; virtual-source velocity; Analytical models; Data models; Logic gates; MOSFET; Mathematical model; Stress; HEMTs; MOSFETs; quasi-ballistic transport;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2294380
  • Filename
    6702447