DocumentCode
490733
Title
Development of Ultrathin Silicon and Gallium Arsenide Solar Cell for Space Application
Author
Shimodaira, M. ; Matsuda, S.
Author_Institution
Tsukuba Space Center, NASDA, 2-1-1, Sengen, Sakura-mura, Niihari-gun, Ibaraki, 305 Japan
fYear
1983
fDate
18-21 Oct. 1983
Firstpage
183
Lastpage
188
Abstract
The ultrathin silicon (Si) solar cell and gallium arsenide (Ga As) solar cell for increasing radiation resistance and improving power to mass ratio and improving high energy conversion efficiency, have been developed from 1982. NASDA has almost completed fundemental evaluation of these solar cells and got prospect for space applications. The ultrathin 50¿m Si solar cell with maximum efficiency 13.9% (average 13.2%) at Air Mass Zero (AMO) [135.3mW/cm2 illumination and at 28°C] and the remaining Isc ratio of 82% after irradiation of lMeV electron fluences of 1 à 1015 e/cm2 have been demonstrated. While, the GaAs solar cell consists of P-AlGaAs/P-GaAs/n-GaAs and have the maximum efficiency of 19.2% (average 17.5%) at AMO and the remaining Isc ratio of 87% after irradiation of lMeV electron fluences of 1 à 1015 e/cm2.
Keywords
Electrons; Etching; Gallium arsenide; Lighting; Performance evaluation; Photovoltaic cells; Reproducibility of results; Satellites; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Telecommunications Energy Conference, 1983. INTELEC '83. Fifth International
Conference_Location
Tokyo, Japan
Type
conf
Filename
4793814
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