• DocumentCode
    490733
  • Title

    Development of Ultrathin Silicon and Gallium Arsenide Solar Cell for Space Application

  • Author

    Shimodaira, M. ; Matsuda, S.

  • Author_Institution
    Tsukuba Space Center, NASDA, 2-1-1, Sengen, Sakura-mura, Niihari-gun, Ibaraki, 305 Japan
  • fYear
    1983
  • fDate
    18-21 Oct. 1983
  • Firstpage
    183
  • Lastpage
    188
  • Abstract
    The ultrathin silicon (Si) solar cell and gallium arsenide (Ga As) solar cell for increasing radiation resistance and improving power to mass ratio and improving high energy conversion efficiency, have been developed from 1982. NASDA has almost completed fundemental evaluation of these solar cells and got prospect for space applications. The ultrathin 50¿m Si solar cell with maximum efficiency 13.9% (average 13.2%) at Air Mass Zero (AMO) [135.3mW/cm2 illumination and at 28°C] and the remaining Isc ratio of 82% after irradiation of lMeV electron fluences of 1 × 1015 e/cm2 have been demonstrated. While, the GaAs solar cell consists of P-AlGaAs/P-GaAs/n-GaAs and have the maximum efficiency of 19.2% (average 17.5%) at AMO and the remaining Isc ratio of 87% after irradiation of lMeV electron fluences of 1 × 1015 e/cm2.
  • Keywords
    Electrons; Etching; Gallium arsenide; Lighting; Performance evaluation; Photovoltaic cells; Reproducibility of results; Satellites; Silicon; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Telecommunications Energy Conference, 1983. INTELEC '83. Fifth International
  • Conference_Location
    Tokyo, Japan
  • Type

    conf

  • Filename
    4793814