Analysis and Mitigation of Effect of Plating Stub on Transmission Waveform and Eye Diagram

Author

Guang-Hwa Shiue ; Chi-Lou Yeh ; Zhi-Hao Zhang ; Hung-Hsiang Cheng

Author_Institution

Electron. Eng. Dept., Chung Yuan Christian Univ., Jhongli, Taiwan

Volume

4

Issue

2

fYear

2014

fDate

Feb. 2014

Firstpage

279

Lastpage

290

Abstract

Plating stubs inevitably form in the manufactured processes for ball grid array packages. This paper investigates how the plating stub affects the time-domain transmission (TDT) waveform and eye diagram. A scheme for mitigating the effect of the plating stub is also proposed. The effects of time-domain reflection noise generated by the plating stub on the TDT waveform are precisely studied using a lattice diagram. Simple and approximate formulas are developed to determine whether the eye diagram crosses the eye mask. With this determination, the maximum length of the plating stub can be estimated.

Keywords

ball grid arrays; electroplating; manufacturing processes; time-domain analysis; TDT waveform; ball grid array packages; eye diagram; eye mask; lattice diagram; manufactured process; mitigation effect; plating stub; time-domain reflection noise; time-domain transmission waveform; Delay effects; Lattices; Metals; Microstrip; Noise; Resonant frequency; Time-domain analysis; Eye diagram; lattice diagram; plating stub; time-domain transmission (TDT) waveform;

fLanguage

English

Journal_Title

Components, Packaging and Manufacturing Technology, IEEE Transactions on

Publisher

ieee

ISSN

2156-3950

Type

jour

DOI

10.1109/TCPMT.2013.2284029

Filename

6631506