• DocumentCode
    4988
  • Title

    Improving the Vertical Light-Extraction Efficiency of GaN-Based Thin-Film Flip-Chip LEDs With p-Side Deep-Hole Photonic Crystals

  • Author

    Qing-An Ding ; Kang Li ; Fanmin Kong ; Xinlian Chen ; Jia Zhao

  • Author_Institution
    Sch. of Inf. Sci. & Eng., Shandong Univ., Jinan, China
  • Volume
    10
  • Issue
    11
  • fYear
    2014
  • fDate
    Nov. 2014
  • Firstpage
    909
  • Lastpage
    916
  • Abstract
    This study systematically investigates the light-extraction efficiency (LEE) of GaN-based thin-film flip-chip light-emitting diodes (TFFC LEDs) with deeply etched photonic crystals (PhC). The optimal structure can be obtained by scanning the structural parameters using a three-dimensional finite-difference time-domain simulation. The concentration of the internal emission pattern within a limited extraction cone is significantly influenced by several structural parameters. The light-collection enhancement within an extraction cone explains the peak LEE caused by optimized structural parameters such as the p-GaN thickness, the air-hole depth, the lattice constant and the filling factor. The maximum extraction efficiency can reach 65% in the case of a p-GaN thickness of 140 nm, air-hole depth of 240 nm, lattice constant of 350 nm and filling factor of 0.40. Additionally, fabricating the optimal electrical contacts on the planar top surface of the n side can contribute to a higher potential enhancement.
  • Keywords
    III-V semiconductors; finite difference time-domain analysis; flip-chip devices; gallium compounds; lattice constants; light emitting diodes; photonic crystals; sputter etching; thin film devices; wide band gap semiconductors; GaN; GaN-based thin-film flip-chip LED; TFFC LED; air hole depth; air-hole depth; deeply etched photonic crystals; filling factor; internal emission pattern; lattice constant; light collection enhancement; limited extraction cone; optimal structure; optimized structural parameters; p-GaN thickness; p-side deep-hole photonic crystals; planar top surface; size 140 nm; size 240 nm; three-dimensional finite-difference time-domain simulation; vertical light extraction efficiency; Etching; Filling; Finite difference methods; Gallium nitride; Lattices; Light emitting diodes; Time-domain analysis; Deep-hole photonic crystals (PhC); finite-difference time-domain (FDTD) method; light-emitting diodes (LEDs); light-extraction efficiency (LEE); thin-film flip-chip LEDs (TFFC LEDs);
  • fLanguage
    English
  • Journal_Title
    Display Technology, Journal of
  • Publisher
    ieee
  • ISSN
    1551-319X
  • Type

    jour

  • DOI
    10.1109/JDT.2013.2281236
  • Filename
    6595545