Title :
Achieving resolution far beyond the diffraction limit with RAPID photolithography
Author :
Li, Linjie ; Gattass, Rafael R. ; Gershgoren, Erez ; Fourkas, John T.
Author_Institution :
Dept. of Chem. & Biochem., Univ. of Maryland, College Park, MD, USA
Abstract :
A method to scale the resolution in photolithographic fabrication is introduced, in which one laser beam is used to initiate multiphoton absorption polymerization in a negative-tone photoresist while a second, phase-shaped laser beam is used to deactivate the polymerization. This approach allows for fabrication of polymeric nanostructures with lambda/20 resolution.
Keywords :
laser beam machining; photolithography; polymerisation; diffraction limit; laser beams; multiphoton absorption polymerization; photolithographic fabrication; Absorption; Diffraction; Educational institutions; Laser beams; Laser modes; Lithography; Optical device fabrication; Optical polymers; Resists; Spatial resolution; (110.4235) Nanolithography; (110.5220) Photolithography; (110.6895) Three-dimensional lithography; (120.4610) Optical fabrication; (220.4241) Nanostructure fabrication;
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
