Achieving resolution far beyond the diffraction limit with RAPID photolithography

Author

Li, Linjie ; Gattass, Rafael R. ; Gershgoren, Erez ; Fourkas, John T.

Author_Institution

Dept. of Chem. & Biochem., Univ. of Maryland, College Park, MD, USA

fYear

2009

fDate

2-4 June 2009

Firstpage

1

Lastpage

2

Abstract

A method to scale the resolution in photolithographic fabrication is introduced, in which one laser beam is used to initiate multiphoton absorption polymerization in a negative-tone photoresist while a second, phase-shaped laser beam is used to deactivate the polymerization. This approach allows for fabrication of polymeric nanostructures with lambda/20 resolution.

Keywords

laser beam machining; photolithography; polymerisation; diffraction limit; laser beams; multiphoton absorption polymerization; photolithographic fabrication; Absorption; Diffraction; Educational institutions; Laser beams; Laser modes; Lithography; Optical device fabrication; Optical polymers; Resists; Spatial resolution; (110.4235) Nanolithography; (110.5220) Photolithography; (110.6895) Three-dimensional lithography; (120.4610) Optical fabrication; (220.4241) Nanostructure fabrication;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on

Conference_Location

Baltimore, MD

Print_ISBN

978-1-55752-869-8

Electronic_ISBN

978-1-55752-869-8

Type

conf

Filename

5225712