Process development for micro — nano patterning of metallic layers with applications in photonics

The paper presents the fabrication experiments for micro - nano patterning of metallic layers on silicon or dielectric substrate, using optical lithography, electron beam lithography and lift-off techniques. Both optical lithography and EBL were performed using bi-layer resist techniques, in order to obtain the ldquounder cutrdquo effect, to ease the lift-off. The fabricated micro and nano structures have applications in optoelectronics (metallic electrodes) and nanoplasmonics (metallic plasmonic waveguides and structures).