DocumentCode :
510391
Title :
Enhancement and stabilization of photoluminescence of porous silicon by LaF3 passivation
Author :
Mou, Sinthia Shabnam ; Rahman, Md.Abdur ; Ismail, Abu Bakar Md.
Author_Institution :
School of Engineering and Computer Science, Independent University, Dhaka 1212, Bangladesh
fYear :
2009
fDate :
2-6 Nov. 2009
Firstpage :
1
Lastpage :
2
Abstract :
E-beam evaporated LaF3 passivation of porous silicon (PS) has been investigated in this report. Heat treatment of the LaF{in3-passivated PS structure improves the PL characteristics. Passivation with thinner layer of LaF{in3 leaded to a good enhancement of photoluminescence intensity while thicker layer showed stabilization of photoluminescence.
Keywords :
Electronic mail; Etching; Heat treatment; Optical films; Optical refraction; Passivation; Photoluminescence; Physics; Protection; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
Conference_Location :
Shanghai, China
Print_ISBN :
978-1-55752-877-3
Electronic_ISBN :
978-1-55752-877-3
Type :
conf
Filename :
5377050
Link To Document :
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