DocumentCode
512189
Title
Yb-doped silica preform precursor nanoparticles and the photodarkening in them
Author
Xiong, Liangming ; Sekiya, Edson H. ; Saito, Kazuya
Author_Institution
Frontier Materials Lab, Research Center for Advanced Photon Technology, Toyota Technological Institute, Nagoya, Japan 468-8511
Volume
2009-Supplement
fYear
2009
fDate
2-6 Nov. 2009
Firstpage
1
Lastpage
8
Abstract
A series of Yb-doped silica-based nanoparticles were fabricated in the MCVD process. Their compositions and doping levels were well controlled from 0 to 0.53 wt% for Yb and from 0 to 2.1 wt% for Al. The nanoparticles are of about 21.3 ± 4.6 nm in size, but their sizes and NIR absorption are influenced by the Al concentration. At a fixed Al doping level, the NIR absorption depends on the Yb concentration. The nanoparticles exhibit a strong composition dependence of the photodarkening induced by the X-ray irradiation.
Keywords
Doping; Electromagnetic wave absorption; Fabrication; Glass; Nanoparticles; Photochromism; Preforms; Refractive index; Silicon compounds; Thermal resistance; Al; MCVD; UV-Vis-NIR absorption; X-ray irradiation; Yb; nanoparticle; photodarkening; silica;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
Conference_Location
Shanghai, China
Print_ISBN
978-1-55752-877-3
Electronic_ISBN
978-1-55752-877-3
Type
conf
Filename
5405464
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