DocumentCode :
512283
Title :
Application of nanosphere lithography to the fabrication of nanorod LEDs and to the performance enhancement of conventional LEDs
Author :
Cheng, Yun-Wei ; Lu, Tzu-Chun ; Ke, Min-Yung ; Pan, Kun-Mao ; Chen, Liang-Yi ; Chiang, Hung-Li ; Huang, Ying-Yuan ; Huang, JianJang
Author_Institution :
Graduate Institute of Photonics and Optoelectronics, National Taiwan University, 1, Roosevelt Road, Section 4, Taipei, 106, Taiwan
Volume :
2009-Supplement
fYear :
2009
fDate :
2-6 Nov. 2009
Firstpage :
1
Lastpage :
8
Abstract :
The process of nanosphere lithography was developed and applied to LED epistructure. We demonstrated p-i-n nanorod LED arrays with some specific characteristics. Moreover, LEDs encompassed with self-aligned nanorods are fabricated. Light diffraction behaviors are characterized. The results are explained by photonic crystal effect.
Keywords :
Etching; Gallium nitride; Light emitting diodes; Lithography; Nanoscale devices; Nanowires; Optical arrays; Optical device fabrication; PIN photodiodes; Photonics; GaN; light emitting diode; light extraction efficiency; nanorod; nanosphere lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
Conference_Location :
Shanghai, China
Print_ISBN :
978-1-55752-877-3
Electronic_ISBN :
978-1-55752-877-3
Type :
conf
Filename :
5405565
Link To Document :
بازگشت