DocumentCode :
512597
Title :
Modeling of threshold voltage for undoped surrounding gate MOSFET: A Gaussian approach
Author :
Roy, Palash ; Syamal, Binit ; Mohankumar, N. ; Sarkar, C.K.
Author_Institution :
Dept. of Electron. & Telecommun. Eng., Jadavpur Univ., Kolkata, India
fYear :
2009
fDate :
14-16 Dec. 2009
Firstpage :
1
Lastpage :
4
Abstract :
We have developed analytically a threshold voltage model and explored the threshold voltage roll-off and drain-induced barrier lowering (DIBL) effects for undoped surrounding-gate (SG) MOSFETs. The model is derived by applying the Gauss law by considering an elemental area of the channel rather than using Poisson equation as implemented earlier. For this threshold voltage model, the threshold voltage roll-off and DIBL effects have been analyzed and compared with 3-D numerical simulation results for different channel lengths, channel thickness and oxide thickness and a very good agreement between them has been observed.
Keywords :
Gaussian processes; MOSFET; Poisson equation; numerical analysis; semiconductor device models; 3-D numerical simulation; Gaussian approach; Poisson equation; channel lengths; channel thickness; drain-induced barrier lowering effects; oxide thickness; threshold voltage model; undoped surrounding gate MOSFET; Argon; Boundary conditions; CMOS technology; Gaussian channels; MOSFET circuits; Numerical simulation; Poisson equations; Semiconductor films; Silicon; Threshold voltage; Drain induced barrier lowering (DIBL); Surrounding-Gate (SG); Threshold voltage; Threshold voltage roll-off;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computers and Devices for Communication, 2009. CODEC 2009. 4th International Conference on
Conference_Location :
Kolkata
Print_ISBN :
978-1-4244-5073-2
Type :
conf
Filename :
5407101
Link To Document :
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