DocumentCode
512650
Title
Mixed mode simulation of heavy ion impact on 3D SRAM cell
Author
Rathod, S.S. ; Saxena, A.K. ; Dasgupta, S.
Author_Institution
Indian Inst. of Technol. Roorkee, Roorkee, India
fYear
2009
fDate
14-16 Dec. 2009
Firstpage
1
Lastpage
4
Abstract
Scaling made the semiconductor devices more susceptible to the impact of heavy ion bombardment. Electronic devices used in extraterrestrial space for military and communication purposes can be extremely vulnerable to high concentrations of heavy ions in the outer atmosphere. The impact of heavy ions can induce unwanted changes in the data state by flipping the output nodes of the SRAM cell. The objective of this paper is to study the impact of heavy ions on the data state of the SRAM cell. Key feature is the simulation of a 6T SRAM cell as a single contiguous block of silicon, demonstrating a true 3D mixed-mode simulation capability. Upset probability changes with variation in the characteristic distance of the heavy ion strike. Process and device mixed mode simulations are carried out.
Keywords
SRAM chips; ion beam effects; 3D SRAM Cell; 3D mixed mode simulation; electronic devices; heavy ion bombardment; heavy ion strike characteristic distance; semiconductor devices; upset probability; Atmospheric modeling; Circuits; Computational modeling; Cosmic rays; Implants; Ionizing radiation; Random access memory; Silicon; Single event upset; Space technology; Heavy Ion; Radiation Hardened; SRAM; Simulation; Single Event Upset;
fLanguage
English
Publisher
ieee
Conference_Titel
Computers and Devices for Communication, 2009. CODEC 2009. 4th International Conference on
Conference_Location
Kolkata
Print_ISBN
978-1-4244-5073-2
Type
conf
Filename
5407216
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