• DocumentCode
    513902
  • Title

    Recent Progress in Silicon Homo- and Heterojunction Bipolar Technology

  • Author

    Treitinger, L.

  • Author_Institution
    SIEMENS AG, Corporate Research and Development, Microelectronics, Otto-Hahn-Ring 6, D-8000 Munich 83, FRG
  • fYear
    1991
  • fDate
    16-19 Sept. 1991
  • Firstpage
    3
  • Lastpage
    10
  • Abstract
    The purpose of this paper is twofold. First, it compares the latest European achievements in this field, originating mainly from a cooperative European project (ESPRIT 2016, TIP BASE) with the state of the art all over the world confirming the strong position of the European industry in this particular sector. Second, it asks for confidence in the enormous unbroken potential of silicon bipolar technology. This potential consists of the fast developing silicon processing techniques (driven by the mainstream VLSI technologies) in combination with new materials enabling both permanent further scaling of existing device concepts as well as the introduction and realization of new device configurations.
  • Keywords
    Active noise reduction; Application software; Computer aided manufacturing; Double heterojunction bipolar transistors; Energy consumption; MOSFETs; Manufacturing processes; Microelectronics; Mobile communication; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
  • Conference_Location
    Montreux, Switzerland
  • Print_ISBN
    0444890661
  • Type

    conf

  • Filename
    5436265