DocumentCode :
51396
Title :
Two-Step Plasma-Texturing Process for Multicrystalline Silicon Solar Cells With Linear Microwave Plasma Sources
Author :
Chan, Boon Teik ; Kunnen, Eddy ; Xu, Kaidong ; Boullart, Werner ; Poortmans, Jef
Author_Institution :
Imec vzw, Leuven, Belgium
Volume :
3
Issue :
1
fYear :
2013
fDate :
Jan. 2013
Firstpage :
152
Lastpage :
158
Abstract :
Surface texturing of crystalline silicon solar cells allows reduction of the reflection of sunlight and enhances photon generation. Plasma-based texturing offers significant advantages over the conventional wet approach, i.e., reduced Si consumption, thin wafer compatibility, increased throughput, and reduced chemical waste. However, it still suffers from insufficient electric yield, i.e., bad performance of plasma-processed solar cells. This paper describes advances made in plasma texturing by means of a linear microwave plasma source. The advantage of a two-step plasma-texturing process is demonstrated, leading to a smoother surface roughness, and resulting in an increased open-circuit voltage, together with a reduced processing time. In addition, the described technology allows a significant reduction of surface damage and could be implemented on a production line for crystalline silicon solar cell manufacturing.
Keywords :
elemental semiconductors; plasma materials processing; silicon; solar cells; surface roughness; surface texture; Si; linear microwave plasma source; multicrystalline silicon solar cell; open-circuit voltage; photon generation; sunlight reflection; surface roughness; thin wafer compatibility; two-step plasma texturing; Plasmas; Rough surfaces; Silicon; Surface morphology; Surface roughness; Surface texture; Surface treatment; Plasma materials processing; texturing;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2012.2216510
Filename :
6322998
Link To Document :
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