DocumentCode
514173
Title
Multipolar Plasma Treatments of In0.53 Ga0.47 As Surface for MIS Devices Application
Author
Renaud, M. ; Boher, P. ; Barrier, J. ; Schneider, J. ; Chane, J.P.
Author_Institution
Laboratoires d´´Electronique et de Physique Appliquée, 3, Avenue Descartes - 94451 LIMEIL BREVANNES CEDEX (France)
fYear
1987
fDate
14-17 Sept. 1987
Firstpage
129
Lastpage
133
Abstract
Multipolar plasma treatments combined with a high vacuum system and a monitoring by ellipsometry have been developed to achieve high electrical quality InGaAs/Si3 N4 interfaces. Interface states density in the low 1011 cm¿2 eV¿1 are obtained under controlled conditions, which is therefore suitable for a MISFET technology.
Keywords
FETs; Indium gallium arsenide; Insulation; MISFETs; Optical surface waves; Passivation; Plasma applications; Plasma devices; Surface treatment; Vacuum systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location
Bologna, Italy
Print_ISBN
0444704779
Type
conf
Filename
5437017
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