DocumentCode :
514184
Title :
The role of holes and electrons in the aging of MOS transistors
Author :
Tosi, M. ; Baldi, L. ; Maggioni, F.
Author_Institution :
SGS Microelettronica, via C. Olivetti 2, 20041 Agrate Brianza (MI)-Italy
fYear :
1987
fDate :
14-17 Sept. 1987
Firstpage :
151
Lastpage :
154
Abstract :
A new kind of representation of aging effects a MOS transsistors on a VD/VG diagrams is proposed. The working curue of N-channel or P-channel transistors, for different loading factors, can be easily plotted in this diagram and the regions of hole or electrons injection during the normal operating cycle identified. Since any change in transistor technology is reflected in a change of the iso-aging diagram, this kind of representation allows to compare different technologies and their limits with the need of different circut configuration. The results of experimental evaluation of different LDD structures are discussed.
Keywords :
Aging; Charge carrier processes; Degradation; Electron traps; Low voltage; MOSFETs; SPICE; Stress; Threshold voltage; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
Print_ISBN :
0444704779
Type :
conf
Filename :
5437056
Link To Document :
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